发明名称 Continuous treatment apparatus
摘要 A continuous treatment apparatus is provided that resists thermal shock and treatment gases and correctly transfers treated objects. An urging mechanism 9 that urges a treated object w is adapted to transfer a treated object w by reciprocating rack member 91 using a pinion 92 in separating compartments 6 between treatment chambers 1, 2, 3, and 4. This arrangement eliminates the need to install rack members 91 and pinion 92 in a severe atomsphere.
申请公布号 US2001050212(A1) 申请公布日期 2001.12.13
申请号 US20010770389 申请日期 2001.01.29
申请人 SHIMADZU MECTEM, INC. 发明人 NAKATSUKASA EIJI;MIKAMI KANJI;KAMOTO KATSUTOSHI
分类号 B65G49/00;C21D1/00;C21D9/00;F27B9/26;F27B17/00;F27B21/08;F27D1/18;F27D3/00;F27D3/12;F27D99/00;(IPC1-7):B65G25/00 主分类号 B65G49/00
代理机构 代理人
主权项
地址