| 摘要 |
An illuminance measurement apparatus for measuring the illuminance of illumination light on an image plane of a projection optical system of an exposure apparatus designed to project the image of a pattern from an illuminated mask on a substrate held on a substrate stage by the projection optical system, including an illuminance meter detachably attached to the substrate stage, the illuminance meter having an illuminance detector, a transmitter for wirelessly transmitting a measurement result of the illuminance detector, a storage cell, and a photoelectric converter for converting part of the illumination light photoelectrically and storing it in the storage cell, and a receiver for receiving the wireless signal including the measurement results transmitted by the transmitter.
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