发明名称 |
LASER REMOVAL OF FOREIGN MATERIALS FROM SURFACES |
摘要 |
A method of fast and complete laser removal of inorganic and organic foreign material, including particles down to submicron-sizes and atomic contaminants, such as heavy metals and alkaline elements, from a substrate without any damage to the substrate, carried out by UV laser irradiation of the substrate surface in a reactive oxygen based gas, which comprises carrying out the removal process in the presence of gas containing F and/or Cl atoms in its molecules.
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申请公布号 |
US2001050272(A1) |
申请公布日期 |
2001.12.13 |
申请号 |
US19990265990 |
申请日期 |
1999.03.11 |
申请人 |
LIVSHITS BORIS BUYANER;GENUT MENACHEN;TEHAR-ZAHAV OFER;ISKEVITCH ELIEZER |
发明人 |
LIVSHITS BORIS BUYANER;GENUT MENACHEN;TEHAR-ZAHAV OFER;ISKEVITCH ELIEZER |
分类号 |
H01L21/302;B23K26/12;H01L21/027;H01L21/306;H01L21/311;(IPC1-7):B23K26/14;B23K26/16;C23F1/00;B44C1/22;C03C25/68 |
主分类号 |
H01L21/302 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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