发明名称 |
SYSTEM AND METHOD RELATING TO VAPOR DEPOSITION |
摘要 |
A method and system for producing a film (preferably a thin film with highly uniform or highly accurate custom graded thickness) on a flat or graded substrate (such as concave or convex optics), by sweeping the substrate across a vapor deposition source operated with time-varying flux distribution. In preferred embodiments, the source is operated with time-varying power applied thereto during each sweep of the substrate to achieve the time-varying flux distribution as a function of time. A user selects a source flux modulation recipe for achieving a predetermined desired thickness profile of the deposited film. The method relies on precise modulation of the deposition flux to which a substrate is exposed to provide a desired coating thickness distribution. |
申请公布号 |
WO0140535(A3) |
申请公布日期 |
2001.12.13 |
申请号 |
WO2000US42520 |
申请日期 |
2000.12.01 |
申请人 |
THE REGENTS OF THE UNIVERSITY OF CALIFORNIA |
发明人 |
MONTCALM, CLAUDE;FOLTA, JAMES, ALLEN;TAN, SWIE-IN;REISS, IRA |
分类号 |
C23C14/34;C23C14/54;C23C16/52;G02B1/10 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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