发明名称 Process for manufacturing integrated chemical microreactors of semiconductor material, and integrated microreactor
摘要 <p>The microreactor is completely integrated and is formed by a semiconductor body (2) having a surface (4) and housing at least one buried channel (3) accessible from the surface of the semiconductor body (2) through two trenches (21a, 21b). A heating element (10) extends above the surface (4) over the channel (3) and a resist region (18) extends above the heating element and defines an inlet reservoir and an outlet reservoir (19, 20). The reservoirs (19, 20) are connected to the trenches (21a, 21b) and have, in cross-section, a larger area than the trenches. The outlet reservoir (20) has a larger area than the inlet reservoir (19). A sensing electrode (12) extends above the surface (4) and inside the outlet reservoir (20). &lt;IMAGE&gt;</p>
申请公布号 EP1161985(A1) 申请公布日期 2001.12.12
申请号 EP20000830400 申请日期 2000.06.05
申请人 STMICROELECTRONICS S.R.L. 发明人 VILLA, FLAVIO;MASTROMATTEO, UBALDO;BARLOCCHI, GABRIELE;CATTANEO, MAURO
分类号 B01J19/00;B01L3/00;B01L7/00;B81B3/00;(IPC1-7):B01J19/00 主分类号 B01J19/00
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