发明名称 |
Plasma treatment apparatus and method |
摘要 |
<p>A plasma treatment apparatus having the capability of uniformly treating an object with plasma at a high treatment speed and a plasma treatment method are provided. This apparatus comprises a tubular vessel having a laterally elongated cross section, a pair of electrodes arranged such that electric flux lines develop substantially in an axial direction of the tubular vessel when one of an AC voltage and a pulse voltage is applied between the electrodes, a gas supply for supplying a streamer generation gas into the tubular vessel, a power source for applying the voltage between the electrodes to generate plural streamers of the gas in the tubular vessel, and a plasma uniform means for making the plural streamers uniform in a lateral direction of the laterally elongated cross section of the tubular vessel to provide the plasma from one end of the tubular vessel. <IMAGE></p> |
申请公布号 |
EP1162646(A2) |
申请公布日期 |
2001.12.12 |
申请号 |
EP20010112611 |
申请日期 |
2001.05.23 |
申请人 |
MATSUSHITA ELECTRIC WORKS, LTD. |
发明人 |
YAMAZAKI, KEIICHI;INOOKA, YUKIKO;SAWADA, YASUSHI;TAGUCHI, NORIYUKI;NAKAZONO, YOSHIYUKI;NAKANO, AKIO |
分类号 |
H05H1/24;H01J37/32;(IPC1-7):H01J37/32 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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