发明名称 Plasma treatment apparatus and method
摘要 <p>A plasma treatment apparatus having the capability of uniformly treating an object with plasma at a high treatment speed and a plasma treatment method are provided. This apparatus comprises a tubular vessel having a laterally elongated cross section, a pair of electrodes arranged such that electric flux lines develop substantially in an axial direction of the tubular vessel when one of an AC voltage and a pulse voltage is applied between the electrodes, a gas supply for supplying a streamer generation gas into the tubular vessel, a power source for applying the voltage between the electrodes to generate plural streamers of the gas in the tubular vessel, and a plasma uniform means for making the plural streamers uniform in a lateral direction of the laterally elongated cross section of the tubular vessel to provide the plasma from one end of the tubular vessel. &lt;IMAGE&gt;</p>
申请公布号 EP1162646(A2) 申请公布日期 2001.12.12
申请号 EP20010112611 申请日期 2001.05.23
申请人 MATSUSHITA ELECTRIC WORKS, LTD. 发明人 YAMAZAKI, KEIICHI;INOOKA, YUKIKO;SAWADA, YASUSHI;TAGUCHI, NORIYUKI;NAKAZONO, YOSHIYUKI;NAKANO, AKIO
分类号 H05H1/24;H01J37/32;(IPC1-7):H01J37/32 主分类号 H05H1/24
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