发明名称 |
PHOTORESIST COMPOSITION FOR THREE-DIMENSIONAL PHOTO- FORMING |
摘要 |
PROBLEM TO BE SOLVED: To provide a photosetting resin composition capable of giving three- dimensional photo-molded form having an overhang part or another complex shape with ease by using only photosetting resin composition without arranging a separate support member in a molding bath nor integrally molding a supporting part in the form. SOLUTION: This photosetting resin composition for three-dimensional photo- molding is characterized by comprising (a) a polymerizable compound composed of at least one selected from radical-polymerizable compounds and cationically polymerizable compounds and (b) a photoinitiator and having 20-90 deg.C melting temperature.
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申请公布号 |
JP2001342204(A) |
申请公布日期 |
2001.12.11 |
申请号 |
JP20000165685 |
申请日期 |
2000.06.02 |
申请人 |
TEIJIN SEIKI CO LTD |
发明人 |
TAMURA JUNICHI;HAGIWARA TSUNEO;OTAKE MAKOTO |
分类号 |
G03F7/027;B29C67/00;C08F2/50;C08F290/06;C08F299/00;C08G65/26;(IPC1-7):C08F2/50 |
主分类号 |
G03F7/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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