发明名称 PHOTORESIST COMPOSITION FOR THREE-DIMENSIONAL PHOTO- FORMING
摘要 PROBLEM TO BE SOLVED: To provide a photosetting resin composition capable of giving three- dimensional photo-molded form having an overhang part or another complex shape with ease by using only photosetting resin composition without arranging a separate support member in a molding bath nor integrally molding a supporting part in the form. SOLUTION: This photosetting resin composition for three-dimensional photo- molding is characterized by comprising (a) a polymerizable compound composed of at least one selected from radical-polymerizable compounds and cationically polymerizable compounds and (b) a photoinitiator and having 20-90 deg.C melting temperature.
申请公布号 JP2001342204(A) 申请公布日期 2001.12.11
申请号 JP20000165685 申请日期 2000.06.02
申请人 TEIJIN SEIKI CO LTD 发明人 TAMURA JUNICHI;HAGIWARA TSUNEO;OTAKE MAKOTO
分类号 G03F7/027;B29C67/00;C08F2/50;C08F290/06;C08F299/00;C08G65/26;(IPC1-7):C08F2/50 主分类号 G03F7/027
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