| 发明名称 |
Method of patterning organic polymer film and method for fabricating semiconductor device |
| 摘要 |
An organic polymer film patterning method includes the steps of: defining a resist film on a selected area of a substrate; depositing an organic polymer film over the substrate by a plasma CVD process so that the resist film is covered with part of the organic polymer film; and removing the resist film along with the part of the organic polymer film that has covered the resist film.
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| 申请公布号 |
US6329227(B2) |
申请公布日期 |
2001.12.11 |
| 申请号 |
US20010789738 |
申请日期 |
2001.02.22 |
| 申请人 |
MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD. |
发明人 |
ANDA YOSHIHARU;NISHITSUJI MITSURU;KAWASHIMA KATSUHIKO;TANAKA TSUYOSHI |
| 分类号 |
H01L21/285;H01L21/308;H01L21/311;H01L21/312;(IPC1-7):H01L21/00;H01L21/84 |
主分类号 |
H01L21/285 |
| 代理机构 |
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