发明名称 Workpiece irradiation system
摘要 The invention relates to a workpiece irradiation system which has several individually adjustable deflecting devices, and in which several spatially mutually separated individual processing beam pencils are respectively deflected separately, by means of the deflecting devices arranged in the optical beam path, to at least one workpiece to be irradiated, to variable points or surfaces on the workpiece. According to the invention, an additional beam source is arranged in the workpiece irradiation system for the production of at least one measuring beam pencil, such that the measuring beam pencil emitted by the additional beam source is simultaneously incident on several deflecting devices, and that a measuring receiving device which is sensitive to the wavelength of the measuring beam is arranged in the workpiece irradiation system such that it receives at least a portion of the measuring beam pencils, deflected by the irradiated deflecting devices, for the detection of the deflecting action of the deflecting devices.
申请公布号 US6329634(B1) 申请公布日期 2001.12.11
申请号 US20000617484 申请日期 2000.07.17
申请人 CARL-ZEISS-STIFTUNG 发明人 SCHWEIZER JüRGEN
分类号 B23K26/04;B23K26/067;(IPC1-7):B23K26/36 主分类号 B23K26/04
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