| 摘要 |
According to the invention, a cleaning method and a cleaning apparatus are disclosed for removing organic contaminants on a surface of a color filter without damaging pigment portions of the color filter. The cleaning is performed by using a source of ultraviolet radiation having a wavelength equal to or less than 180 nm (most preferably a wavelength of 172 nm), which does not transmit through the transparent electrodes (e.g., ITO film, IZO film or the like), thereby protecting the pigment portions of the color filter. As a result, the glass substrate can be cleaned by the ultraviolet radiation without discoloring the pigment portions of the color filter and the cleaning effect is increased because the exposure time to the ultraviolet radiation is not limited.
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