发明名称 METAL OXIDE PRECURSOR SOLUTION AND METAL OXIDE THIN FILM
摘要 PROBLEM TO BE SOLVED: To provide a metal oxide precursor solution having excellent storage stability which comprises an aromatic compound solvent - a metal oxide polymer complex where the metal oxide polymer has higher degree of polymerization than a metal oxide oligomer and is structurally well controlled in two dimensional directions based on the surface of the aromatic ring, and to provide a uniform metal oxide thin film having no crack which is formed using the solution. SOLUTION: This metal oxide thin film is obtained by a process comprising the steps of mixing 0.03 to 3.0 mol of a metal salt with 1 L of an aromatic compound solvent containing water in an amount of 0.01 mol to less than 0.1 mol based on 1 mol of the metal salt, heating to hydrolyze the metal salt, adding alcohol solution containing water in an amount of 0.1 mol to 2.0 mol based on 1 mol of the metal salt, mixing and heating to hydrolyze the metal salt into a metal hydroxide, dehydrating and condensing the metal hydroxide, and concentrating to obtain a metal oxide precursor solution. The metal oxide thin film is obtained by coating the precursor solution onto a substrate, drying and heat-treating.
申请公布号 JP2001342018(A) 申请公布日期 2001.12.11
申请号 JP20000162453 申请日期 2000.05.31
申请人 JAPAN CARLIT CO LTD:THE;RENGAKUJI SEIICHI 发明人 HARA YOSUKE;SHINAGAWA AKIHIRO;SHINDO NAGAMITSU;RENGAKUJI SEIICHI
分类号 C01G1/02;B01J35/02;C01G23/04;C09D1/00;(IPC1-7):C01G1/02 主分类号 C01G1/02
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