发明名称 Method for manufacturing an orifice plate for use of a liquid discharge, an orifice plate, a liquid discharge provided with such orifice plate, and a method for manufacturing such liquid discharge
摘要 A method for manufacturing an orifice plate used for a liquid discharge provided with discharge port for discharging liquid comprises the steps of preparing a non-conductive plate having recessed portion formed on the circumference of the flat portion corresponding to the discharge port, forming a first conductive material peelable from the non-conductive plate only in the recessed portion of the non-conductive plate, forming a plate member by plating the first conductive material with a second conductive material by electroforming method after the formation of the first conductive material, and obtaining the orifice plate having the discharge port by peeling off the plate member from the non-conductive plate. With the method thus arranged, it is possible to materialize the same precision as in the glass mask used for photolithography, and make the variation of orifice areas smaller for the formation of highly densified orifices.
申请公布号 US6328420(B1) 申请公布日期 2001.12.11
申请号 US19980110025 申请日期 1998.07.02
申请人 CANON KABUSHIKI KAISHA 发明人 KOYAMA SHUJI;MASUDA KAZUAKI;IKEGAME KEN;MIHARA HIROAKI;KASHINO TOSHIO;ISHINAGA HIROYUKI
分类号 B41J2/05;B41J2/135;B41J2/16;(IPC1-7):B41J2/135 主分类号 B41J2/05
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