| 摘要 |
PROBLEM TO BE SOLVED: To provide a gas barrier film capable of preventing the flaw caused by the dust adhering to the surface of a base material film in a base material film manufacturing process or the dust attracted to the surface of the base material film in a vacuum tank, where an inorganic compound layer is vapor- deposited on the base material film, by the charge of the base material film, the flaw caused by a lubricant added to the base material film and the flaw caused by the charge of the inorganic compound vapor-deposited film due to secondary electrons and the are discharge thereof. SOLUTION: In the gas barrier laminated film wherein the inorganic compound layer is provided on at least the single surface of the base material film, the inorganic compound layer is formed by laminating a transparent conductive oxide layer and a gas barrier layer comprising either one of or both of aluminum oxide and silicon oxide on the surface of the base material film so that the transparent conductive oxide layer is formed on the surface of the base material film.
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