| 摘要 |
PROBLEM TO BE SOLVED: To provide a method for producing a film excellent in gas barrier properties and transparency. SOLUTION: In a sputtering system obtained by providing a pair of targets so as to face each other, the presusre of an inert gas in the system is controlled to <=0.5 Pa, voltage is applied on the space between the targets to form a plasma space in which target atoms are scattered on the space part between the the targets, and the target atoms are deposited on a film at a film thickness of 5 to 200 nm.
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