METHOD FOR FORMING METAL INTERCONNECTION OF SEMICONDUCTOR DEVICE,申请号KR20000028335-传众专利搜索

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发明名称	METHOD FOR FORMING METAL INTERCONNECTION OF SEMICONDUCTOR DEVICE
摘要
申请公布号	KR20010107101(A)	申请公布日期	2001.12.07
申请号	KR20000028335	申请日期	2000.05.25
申请人	SAMSUNG ELECTRONICS CO., LTD.	发明人	CHOI, GIL HYEON;KIM, BYEONG HUI;LEE, JONG MYEONG;LEE, MYEONG BEOM
分类号	H01L21/283;(IPC1-7):H01L21/283	主分类号	H01L21/283
代理机构		代理人
主权项
地址

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