发明名称 X-RAY STRESS MEASURING METHOD AND X-RAY STRESS MEASURING DEVICE
摘要 <p>PROBLEM TO BE SOLVED: To solve the disadvantage of conventional X-ray stress measuring methods that a change of angleψoften varies the penetrating depth of X-ray to cause the measurement of the stress in a different depth. SOLUTION: This X-ray stress measuring method comprises injecting the X-ray from an X-ray source 2 to a measuring subject 1 at a prescribed angle, detecting the X-ray diffracted by the measuring subject 1 by an X-ray detector 3, and measuring the internal stress on the basis of the detected value. In this method, when the X-ray from the X-ray source is injected to an optional position of the measuring subject at a set angle to the measuring subject surface, and the measuring subject is rotated around anω-axis right-angled to the incident X-ray r1 on the surface of the measuring subject 1 surface and anχ-axis conformed to the incident X-ray r1 when rotating theω-axis, the angleψformed by the normal N of a diffraction surface and the normal L of the measuring subject surface is changed while rotating the measuring subject so that the angle formed by the measuring subject surface 1 and the incident X-ray r1 on the plane passing an X-ray emitting point P, the incident X-ray r1 and a diffracted X-ray r2 is constant to measure the diffraction line.</p>
申请公布号 JP2001336992(A) 申请公布日期 2001.12.07
申请号 JP20000155702 申请日期 2000.05.26
申请人 SHIN SANGYO SOUZOU KENKYU KIKO;KAWASAKI HEAVY IND LTD 发明人 YANASE ETSUYA;KASA YOSHITOKU
分类号 G01L1/00;G01L1/25;G01N23/20;(IPC1-7):G01L1/00 主分类号 G01L1/00
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