PRODUCING METHOD OF BLANKS FOR PHOTOMASK AND METHOD FOR PRODUCING PHOTOMASK

摘要

PROBLEM TO BE SOLVED: To provide a film which has high uniformity of optical characteristic in the surface of substrate. SOLUTION: This method for producing blanks for photomask is provided with a target and a substrate which is disposed on the position opposed to the target and is the object to be film-formed in a chamber and enables the reactive sputtering by supplying sputtering gases including a reactive gas into the chamber. This method for producing blanks for photomask is further characterized by that a target which is perforated with gas emitting holes communicated with a gas supplying pipe is used as the target and the reactive sputtering is performed while supplying the sputtering gas including the reactive gas toward the substrate through the gas emitting holes of the target.