发明名称 |
SYSTEM AND METHOD FOR TOTAL MANAGEMENT OF CHEMICAL SUBSTANCE |
摘要 |
<p>PROBLEM TO BE SOLVED: To provide a management system and method of chemical substance capable of calculating the discharge/discarding quantity of a new chemical substance when the new chemical substance is produced in a certain process by the chemical reaction of a substance constituting a material or a product charged to the process. SOLUTION: A substance constituting a material or a product to be charged into a process, the kind of a substance in the discharged/discarded place o the substance and the ratio of the amounts of these substances are stored in a discharge coefficient data base as a data base. The kind of the substance in the discharged/discarded place includes the kind of a substance generated in the discharged/moved place of the substance constituting the charged material or product as a data base and the produced substance includes a substance produced by a chemical reaction.</p> |
申请公布号 |
JP2001338105(A) |
申请公布日期 |
2001.12.07 |
申请号 |
JP20000161110 |
申请日期 |
2000.05.26 |
申请人 |
HITACHI LTD |
发明人 |
ICHIKAWA YOSHIAKI;SEKINE AKIRA;ONO TAKAKO;SATO HIROTAKA;MATSUI TETSUYA |
分类号 |
B09B5/00;G06F17/30;G06Q50/00;G06Q50/26;(IPC1-7):G06F17/60 |
主分类号 |
B09B5/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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