EXPOSURE DEVICE, METHOD FOR MANUFACTURING EXPOSURE DEVICE AND METHOD FOR MANUFACTURING MICRODEVICE

摘要

PROBLEM TO BE SOLVED: To well perform multiple exposure even if the positions of the image planes of respective projection optical modules fluctuate in consequence of the thermal deformation of, for example, lenses. SOLUTION: The pattern images of a mask are formed by projection aligning on a photosensitive substrate by using a projection optical system having plural projection optical modules. A focusing means for respectively aligning the image planes (Ia to Ie) of the respective projection optical modules to the photosensitive substrate in a focusing direction is arranged. The focusing means sets the segments of the image planes of the projection optical modules adjacent to each other, which segments contribute to the formation of partly superposedly exposed regions of their image planes with each other at nearly the same positions in the focusing direction.