发明名称 SEMICONDUCTOR WAFER PROCESSING SYSTEM AND SEMICONDUCTOR WAFER PROCESSING METHOD
摘要 PROBLEM TO BE SOLVED: To enhance the efficiency of probing and trimming processing for an IC chip formed on a semiconductor wafer. SOLUTION: The semiconductor wafer is charged in a probing/trimming device 3, a measured value obtained by probing the IC chip formed on the semiconductor wafer is supplied to a test device 5, converted into trimming data by the test device 5, the trimming data is supplied from the test data 5 to the probing/trimming device 3, and trimming processing is performed by the probing/trimming device 3 on the basis of the trimming data.
申请公布号 JP2001338954(A) 申请公布日期 2001.12.07
申请号 JP20000159720 申请日期 2000.05.30
申请人 MITSUMI ELECTRIC CO LTD 发明人 ABE TOMOHIRO
分类号 H01L21/66;H01L21/822;H01L27/04;(IPC1-7):H01L21/66 主分类号 H01L21/66
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