| 摘要 |
PROBLEM TO BE SOLVED: To provide equipment for a substrate treatment, which prevents a water mark from appearing on the substrate during a dry process after the substrate is cleaned with a process liquid. SOLUTION: The equipment for the substrate treatment treats the substrate 11 having silicon at least on the surface with the process liquid and dries the substrate. The equipment has a process tank 5 equipped with an air intake hole 6 and an air exhaust hole 23, a nozzle 35 and a turntable 8 installed in the process tank, which holds the substrate while it is treated with the process liquid and is dried, and a deoxygenation unit 41 that is installed at the air intake hole and deoxidizes air taken into the process tank from the intake hole.
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