发明名称 METHOD FOR CONTROLLING SOLID SURFACE TREATMENT BY LOW TEMPERATURE PLASMA
摘要 PROBLEM TO BE SOLVED: To provide a method controlling solid surface treatment, in which the treatment conditions can be maintained so that the best surface physical properties of the solid surface can be obtained from the diagnostic result of the state of plasma in performing solid surface treatment using low temperature plasma. SOLUTION: In depositing thin film on the solid surface using low temperature plasma: (a) optical emission spectroscopy of plasma is performed with time to obtain an emission spectrum; (b) two or three bright lines on different wavelengths, having high emission intensities, are selected from the emission spectrum and the relative ratio among the emission intensities is determined; (c) then a physical-property value is measured, with respect to a desired physical property among the physical properties of the thin film to be deposited, while changing treatment conditions to determine the relationship between the above relative ratio among the emission intensities and the physical-property value; and (d) treatment conditions are adjusted so that the measured value of the desired physical property becomes maximum, while monitoring the above relative ratio among the emission intensities. Further, similar process is also applied when the solid surface is treated and processed by using the low- temperature plasma.
申请公布号 JP2001335932(A) 申请公布日期 2001.12.07
申请号 JP20000153865 申请日期 2000.05.24
申请人 NATL INST OF ADVANCED INDUSTRIAL SCIENCE & TECHNOLOGY METI 发明人 KADO TETSUO
分类号 G01N21/67;C23C8/36;C23C14/06;C23C14/54;C23F4/00;H01L21/203;H01L21/302;H01L21/3065;H05H1/00;H05H1/46 主分类号 G01N21/67
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