| 摘要 |
PROBLEM TO BE SOLVED: To minimize reduction in throughput caused by accuracy measurement by shortening time required for measuring accuracy. SOLUTION: A measurement mark can be arranged at a conjugated position that is other than a mask 12 and substantially a conjugate with the pattern surface of the mask 12, for example, the position of a visual field diaphragm 34, thus arranging the measurement mark regardless of the replacement of the mask 12. As a result, for example, when the accuracy is to be measured, the measurement mark can be arranged in parallel with the retraction of the mask 12, and at the same time the measurement mark can be retracted in parallel with the arrangement of the next mask 12.
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