发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device small in a level difference between MODFET and the other element and capable of high speed operation suitable for minute processing. SOLUTION: A side forms the true parts 8, 9 on a semiconductor board 1 by an insulation film 7, a bottom face forms the groove of single crystal silicon 1, and formation is performed by making selection growth in the groove. The level difference with the other element mixed-loaded on the same board can be eliminated, and high integration is enabled. At the same time, elimination length can be shortened, and low consumption power is enabled.
申请公布号 JP2001338988(A) 申请公布日期 2001.12.07
申请号 JP20000159544 申请日期 2000.05.25
申请人 HITACHI LTD 发明人 ODA KATSUYA;WASHIO KATSUYOSHI
分类号 H01L29/73;H01L21/331;H01L21/335;H01L21/8222;H01L21/8234;H01L21/8238;H01L21/8248;H01L21/8249;H01L27/06;H01L27/088;H01L27/092;H01L29/165;H01L29/737;H01L29/778;(IPC1-7):H01L21/823;H01L21/822;H01L21/824 主分类号 H01L29/73
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