Photosensitive composition for the production of photoresists comprises a block copolymer with hydrophobic blocks some at least of which can be converted to hydrophilic blocks by the action of a photoactive active compound

摘要

A photosensitive composition for photo resists comprises a polymer with hydrophobic blocks, of which at least one is capable of generating a hydrophilic block and comprises at its ends a dithioester, thioester-thione, dithiocarbamate or xanthate block and photo-active compound generating under radiation an active species reacting with the hydrophobic block to produce a hydrophilic block. An Independent claim is included for a system comprising a substrate and a film capable of being obtained from the claimed composition.