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发明名称
METHOD FOR MANUFACTURING ISOLATION LAYER OF SEMICONDUCTOR DEVICE
摘要
申请公布号
KR20010106717(A)
申请公布日期
2001.12.07
申请号
KR20000027646
申请日期
2000.05.23
申请人
HYNIX SEMICONDUCTOR INC.
发明人
WON, DAE HUI
分类号
H01L21/76;(IPC1-7):H01L21/76
主分类号
H01L21/76
代理机构
代理人
主权项
地址
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