发明名称 X-RAY LENS, X-RAY PLOTTING DEVICE AND X-RAY EXPOSURE METHOD
摘要 <p>PROBLEM TO BE SOLVED: To provide an X-ray lens capable of being used in an X-ray plotting device which does not use an X-ray mask for proximity exposure. SOLUTION: One or more first grooves, extending in the first direction, are formed on a first face of a base material having the mutually parallel first face and second face. A first line of intersection between an imaginary plane, intersecting orthogonally with the first direction and the inner surface of the first groove, forms a projecting curve toward the inside of the base material. One or more second grooves, extending in the second direction intersecting orthogonally with the first direction, are formed on a second face of the base material. A second line of intersection between an imaginary plane, intersecting orthogonally with the second direction and the inner surface of the second groove, forms a projecting curve toward the inside of the base material. The bottom of the first groove and the bottom of the second groove are arranged separately, at a prescribed interval at the intersection spot between the first groove and the second groove.</p>
申请公布号 JP2001337197(A) 申请公布日期 2001.12.07
申请号 JP20000159942 申请日期 2000.05.30
申请人 SUMITOMO HEAVY IND LTD 发明人 CHO ENHEI
分类号 G21K1/06;G03F7/20;G21K5/02;H01L21/027;(IPC1-7):G21K1/06 主分类号 G21K1/06
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