APPARATUS FOR PLASMA TREATMENT

摘要

PROBLEM TO BE SOLVED: To provide an apparatus for plasma treatment that can generate a high density plasma. SOLUTION: The distance d1 between an under surface of a radial line slot antenna 6 and a top surface of a dielectric plate 2 is set at 6 mm and the thickness d2 of the dielectric plate 2 is set at 30 mm so that an interval D between the under surface of the radial line slot antenna 6 for expressing wavelengths of a microwave as a unit of a distance and the under surface of the dielectric plate 2 becomes approximately 1/2. As a result, good standing waves can be formed in the region between the under surface of the radial line slot antenna 6 and a plasma exciting surface, and the high density plasma can be generated in a processing space 3.