GAS INTRODUCING MECHANISM, METHOD FOR GAS INTRODUCTION, METHOD FOR DETECTING GAS LEAKAGE, AND VACUUM PROCESSING EQUIPMENT

摘要

PROBLEM TO BE SOLVED: To provide a gas introducing mechanism which fixes a gas pressure at a predetermined value in a short time when it supplies a gas to a space between mounting platforms and an object held on the surface to be processed, eliminates waste of gas, and achieves miniaturization of the mechanism. SOLUTION: The gas introducing mechanism 18 introduces a gas into a space between mounting platforms 2 and 6 and an object-to-be-processed W held on the surface of platforms 2 and 6 placed in a vacuum chamber 1 that can hold vacuum state. The gas introducing mechanism is equipped with a gas supply line 19 which supplies the gas into the space between the mounting platforms 2 and 6 and the object W to be processed on the platforms 2 and 6, a manometer 41 which measures the gas pressure in the gas supply line 19, a gas flow control valve 42 which is placed at upstream of the manometer 41 and controls the gas flow in the gas supply line 19, and a control means 36 which controls the gas flow control valve 42 to adjust the pressure level measured, by the manometer 41 to a set pressure level.