发明名称 GAS INTRODUCING SYSTEM FOR TEMPERATURE CONTROL OF PROCESSED BODY
摘要 <p>A gas introducing system for temperature control, wherein a gas temperature-controlled for the control of temperature of a processed body is flown through a gas feed line between the placing surface of a placing table for holding the processed body under vacuum and the rear surface of the processed body, and a flow control valve controls a control means based on the measurement pressure in the gas feed line measured with a manometer so as to control the pressure of a gas flow to the gas feed line to a set pressure, whereby a gas pressure can be controlled to a specified value in a short period, waste of gas can be reduced, and the size of the system can be reduced.</p>
申请公布号 WO2001093321(P1) 申请公布日期 2001.12.06
申请号 JP2001004447 申请日期 2001.05.28
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