| 摘要 |
<p>A gas supply system and an exposure device, wherein exposure light is prevented from being attenuated by a light absorbing substance and is thereby allowed to reach a substrate in a stabilized manner without the optical characteristics of the exposure device being greatly affected. The gas supply system comprises a feed pipe (30) for feeding a predetermined gas to a space (PA), a refiner (33) having a plurality of gas refining units (40, 41) for refining the predetermined gas from a gas to be refined, the feed pipe (30) being connected to the plurality of gas refining units (40, 41).</p> |
