OBJECT PROCESSING APPARATUS AND PLASMA FACILITY COMPRISING THE SAME

摘要

An object processing apparatus in which a plasma is produced in a reaction passage where an object to be processed is passed under the atmospheric pressure by using a high-voltage electrode and a grounding electrode. Even a fluorine compound such as PFC containing CF4 can be effectively decomposed because it is caused to be in contact with the plasma in a small space for a sufficiently long time. The apparatus can be small and simple in structure and therefore can be attached to an individual process chamber.