| 摘要 |
An apparatus for depositing a semiconductor film on a wafer, which is held on a holder inside a reactor, with at least one source gas supplied onto the wafer. The apparatus includes a decontamination film made of a semiconductor that contains at least one constituent element of the semiconductor film to be deposited. The decontamination film covers inner walls of the reactor, which are located upstream with respect to the source gas supplied and/or over the holder.
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