PATTERN DISTORTION DETECTING METHOD AND APPARATUS AND RECORDING MEDIUM FOR PATTERN DISTORTION DETECTION

摘要

Sampling points are generated selectively in a prescribed portion other than the pattern edge portion of a layout pattern used in a semiconductor manufacturing process based on an input that is data of the layout pattern. Simulation results of a pattern to be generated from the layout pattern are obtained for the respective sampling points. Pattern distortion amounts in the portion other than the pattern edge portion are detected by comparing the data of the layout pattern and the simulation results for the respective sampling points.