发明名称 Treatment solution discharge apparatus
摘要 The present invention is a treatment solution discharge apparatus having a main body with a solution storage portion being formed therein, for discharging a treatment solution in the solution storage portion onto a substrate from discharge ports provided in the main body, and has a first treatment solution supply pipe and a second treatment solution supply pipe for supplying the treatment solution to the aforementioned solution storage portion from an outside of the main body, a first temperature control pipe in which a fluid for controlling temperature flows and which is disposed over an outer circumference of the first treatment solution supply pipe, and a second temperature control pipe in which the fluid for controlling temperature flows and which is disposed over an outer circumference of the second treatment solution supply pipe, and the first temperature control pipe is connected to one end portion of a solution storage portion temperature control pipe disposed in the solution storage portion, and the other end portion of the solution storage portion temperature control pipe is connected to a first transfer pipe for transferring the fluid for controlling temperature to a predetermined place outside the main body, and the second temperature control pipe is connected to a second transfer pipe located outside the solution storage portion, for transferring the fluid for controlling temperature directly to a predetermined place outside the main body.
申请公布号 US2001047753(A1) 申请公布日期 2001.12.06
申请号 US20010861720 申请日期 2001.05.22
申请人 TOKYO ELECTRON LIMITED 发明人 NAGAMINE SHUICHI;HAYASHI SHINICHI
分类号 B05C5/02;B05C11/08;B05C11/10;H01L21/00;(IPC1-7):B05C5/00 主分类号 B05C5/02
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