发明名称 Process for preparing a hydrogen sensor
摘要 A high-sensitivity Pd/InP hydrogen sensor was made by a) forming an n-type or p-type semiconductor film on a semiconductor substrate; b) forming a patterned first metal electrode on said semiconductor film, wherein said first metal electrode forms an Ohmic contact with said semiconductor film; and c) forming a second metal electrode on said semiconductor film, said second metal electrode being isolated from said first metal electrode, wherein said second metal electrode forms a Schottky contact with said semiconductor film, wherein a thickness of said second metal electrode and a material of which said second metal electrode is made enable a Schottky barrier height of said Schottky contact to decrease when hydrogen contacts said second metal electrode. The second metal electrode can be physical vapor deposited or electroless plated.
申请公布号 US2001049184(A1) 申请公布日期 2001.12.06
申请号 US20000729883 申请日期 2000.12.05
申请人 CHEN HUEY-ING;LIU WEN-CHAU;CHOU YEN-I;CHU CHIN-YI;PAN HSI-JEN 发明人 CHEN HUEY-ING;LIU WEN-CHAU;CHOU YEN-I;CHU CHIN-YI;PAN HSI-JEN
分类号 G01N27/00;G01N33/00;H01L21/285;(IPC1-7):H01L21/338;H01L21/28;H01L21/44 主分类号 G01N27/00
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