发明名称 |
Process for preparing a hydrogen sensor |
摘要 |
A high-sensitivity Pd/InP hydrogen sensor was made by a) forming an n-type or p-type semiconductor film on a semiconductor substrate; b) forming a patterned first metal electrode on said semiconductor film, wherein said first metal electrode forms an Ohmic contact with said semiconductor film; and c) forming a second metal electrode on said semiconductor film, said second metal electrode being isolated from said first metal electrode, wherein said second metal electrode forms a Schottky contact with said semiconductor film, wherein a thickness of said second metal electrode and a material of which said second metal electrode is made enable a Schottky barrier height of said Schottky contact to decrease when hydrogen contacts said second metal electrode. The second metal electrode can be physical vapor deposited or electroless plated.
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申请公布号 |
US2001049184(A1) |
申请公布日期 |
2001.12.06 |
申请号 |
US20000729883 |
申请日期 |
2000.12.05 |
申请人 |
CHEN HUEY-ING;LIU WEN-CHAU;CHOU YEN-I;CHU CHIN-YI;PAN HSI-JEN |
发明人 |
CHEN HUEY-ING;LIU WEN-CHAU;CHOU YEN-I;CHU CHIN-YI;PAN HSI-JEN |
分类号 |
G01N27/00;G01N33/00;H01L21/285;(IPC1-7):H01L21/338;H01L21/28;H01L21/44 |
主分类号 |
G01N27/00 |
代理机构 |
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代理人 |
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地址 |
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