发明名称 Verfahren zur Herstellung von Halbleiteranordnungen mit mindestens einer einlegierten Elektrode
摘要 864,239. Semi-conductor devices. SIEMENSSCHUCKERTWERKE A.G. Jan. 14, 1960 [Jan. 17, 1959], No. 1407/60: Class 37. In providing an alloy electrode on a semiconductor body, the rate of temperature rise during the heating process is reduced immediately before the eutectic temperature of the electrode and semi-conductor is reached. This allows for solid diffusion to provide a larger region consisting of eutectic composition so that when the eutectic temperature is reached the larger region of substantially uniform composition is melted. The process may be applied to a gold foil alloyed to a silicon body, the eutectic temperature then being about 370‹ C. Impurities may be included in the gold.
申请公布号 DE1101627(B) 申请公布日期 1961.03.09
申请号 DE1959S061374 申请日期 1959.01.17
申请人 SIEMENS-SCHUCKERTWERKE AKTIENGESELLSCHAFT 发明人 EMEIS DIPL.-PHYS. REIMER
分类号 H01L21/00;H01L21/24;H01L29/167 主分类号 H01L21/00
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