发明名称 |
Device for patterning a substrate with patterning cavities |
摘要 |
A patterning device comprises a patterning cavity which has an opening located at the surface of the patterning device within a transfer region, where a substrate during patterning comes into conformal contact with the patterning device. A service cavity is located in a service region of the patterning device and is connected to the patterning cavity, such that a patterning fluid is able to flow from the service cavity to the patterning cavity. A patterning method uses this device.
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申请公布号 |
US6326058(B1) |
申请公布日期 |
2001.12.04 |
申请号 |
US20000528326 |
申请日期 |
2000.03.20 |
申请人 |
INTERNATIONAL BUSINESS MACHINES CORPORATION |
发明人 |
BIEBUYCK HANS;DELAMARCHE EMMANUEL;BRUNO MICHEL;SCHMID HEINZ |
分类号 |
B01J19/00;B41J2/17;C40B60/14;G03F7/00;H05K3/00;(IPC1-7):B05D1/36;B05D5/12 |
主分类号 |
B01J19/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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