发明名称 Device for patterning a substrate with patterning cavities
摘要 A patterning device comprises a patterning cavity which has an opening located at the surface of the patterning device within a transfer region, where a substrate during patterning comes into conformal contact with the patterning device. A service cavity is located in a service region of the patterning device and is connected to the patterning cavity, such that a patterning fluid is able to flow from the service cavity to the patterning cavity. A patterning method uses this device.
申请公布号 US6326058(B1) 申请公布日期 2001.12.04
申请号 US20000528326 申请日期 2000.03.20
申请人 INTERNATIONAL BUSINESS MACHINES CORPORATION 发明人 BIEBUYCK HANS;DELAMARCHE EMMANUEL;BRUNO MICHEL;SCHMID HEINZ
分类号 B01J19/00;B41J2/17;C40B60/14;G03F7/00;H05K3/00;(IPC1-7):B05D1/36;B05D5/12 主分类号 B01J19/00
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