发明名称 |
Gas-filled discharge gap assembly |
摘要 |
In gas-filled discharge gaps having a vitreous electrode activation compound formed of several components. In order to prevent excessive fluctuations of the d.c. sparkover voltage Uag under load, potassium silicate and cesium tungstate are provided as base components of the electrode activation compound to sodium silicate, cesium silicate and titanium.
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申请公布号 |
US6326724(B1) |
申请公布日期 |
2001.12.04 |
申请号 |
US20000669799 |
申请日期 |
2000.09.26 |
申请人 |
EPCOS AG |
发明人 |
DäUMER WOLFGANG;ZOU XIANGYANG;JIFENG QIN |
分类号 |
H01T1/22;H01T4/12;(IPC1-7):H01J63/04 |
主分类号 |
H01T1/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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