| 摘要 |
<p>PROBLEM TO BE SOLVED: To provide a preparing method for cerium oxide slurry scarcely generating a precipitate even after a long-time storage, and capable of polishing a semiconductor wafer without scratching it. SOLUTION: In the method, the cerium oxide slurry is prepared by adding and dispersing a cerium oxide powder into an aqueous medium in a kneading tank of a kneader. The neader is of the type in which mixing blades 11a, 11b are rotated by subsidiary rotating shafts (a), (b), which are rotated by a main rotating shaft (c).</p> |
