发明名称 Process for producing semiconductor devices including an insulating layer with an impurity
摘要 A semiconductor device and a process for producing the same. The device has two conducting layers that are spaced from each other and an organic insulating film for electrically insulating these two conducting layers from each other. The organic insulating film contains contact holes with plugs being embedded therein so as to electrically connect these two conducting layers by the plugs. The process contains a step of forming the organic insulating film on the lower conducting layer. An impurity having a kinetic energy is introduced into the organic insulating film. Next, contact holes are formed in the organic insulating film, and then plugs are formed in the contact holes. An upper conducting layer is formed on the organic insulating film so as to be electrically connected to the plugs.
申请公布号 US6326318(B1) 申请公布日期 2001.12.04
申请号 US20000521865 申请日期 2000.03.08
申请人 SANYO ELECTRIC CO., LTD. 发明人 WATANABE HIROYUKI;MIZUHARA HIDEKI;MISAWA KAORI;HIRASE MASAKI;AOE HIROYUKI
分类号 H01L21/3115;H01L21/312;H01L21/314;H01L21/316;H01L21/768;(IPC1-7):H01L21/31;H01L21/469 主分类号 H01L21/3115
代理机构 代理人
主权项
地址