发明名称 Integrated injection logic devices including injection regions and tub or sink regions
摘要 A complementary bipolar transistor having a lateral npn bipolar transistor, a vertical and a lateral pnp bipolar transistor, an integrated injection logic, a diffusion capacitor, a polysilicon capacitor and polysilicon resistors are disclosed. The lateral pnp bipolar transistor has an emitter region and a collector region which includes high-density regions and low-density regions, and the emitter region is formed in an n type tub region. In the integrated injection logic circuit, collector regions are surrounded by a high-density p type region, and low-density p type regions are formed under the collector regions. The diffusion capacitor and the polysilicon capacitor are formed in one substrate. The diffusion regions except the regions formed by diffusing the impurities in the polysilicon resistors into the epitaxial layer are formed before forming the polysilicon resistors, and polysilicon electrodes are formed along with the polysilicon resistors.
申请公布号 US6326674(B1) 申请公布日期 2001.12.04
申请号 US19990451623 申请日期 1999.11.30
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 KIM JONG-HWAN;KWON TAE-HOON;KIM CHEOL-JOONG;LEE SUK-KYUN
分类号 H01L29/73;H01L21/331;H01L21/8224;H01L21/8226;H01L21/8228;H01L27/02;H01L27/06;H01L27/08;H01L27/082;H01L29/732;(IPC1-7):H01L29/735 主分类号 H01L29/73
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