发明名称 |
Pattern inspection method and apparatus |
摘要 |
An actual pattern image including an auxiliary pattern in a periphery of a pattern of an object to be inspected is recognized. The image of the auxiliary pattern is deleted from the recognized image and an auxiliary-pattern-image-deleted recognized image is produced. An inspection image to be used for inspection is produced from design data from which the auxiliary pattern is removed. The auxiliary-pattern-image-deleted recognized image is compared with the inspection image.
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申请公布号 |
US6327379(B2) |
申请公布日期 |
2001.12.04 |
申请号 |
US19970908553 |
申请日期 |
1997.08.08 |
申请人 |
FUJITSU LIMITED |
发明人 |
MATSUYAMA TAKAYOSHI;KOBAYASHI KEN-ICHI |
分类号 |
G03F1/08;G06T1/00;G06T7/00;H01L21/66;(IPC1-7):G06K9/00 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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