发明名称 Pattern inspection method and apparatus
摘要 An actual pattern image including an auxiliary pattern in a periphery of a pattern of an object to be inspected is recognized. The image of the auxiliary pattern is deleted from the recognized image and an auxiliary-pattern-image-deleted recognized image is produced. An inspection image to be used for inspection is produced from design data from which the auxiliary pattern is removed. The auxiliary-pattern-image-deleted recognized image is compared with the inspection image.
申请公布号 US6327379(B2) 申请公布日期 2001.12.04
申请号 US19970908553 申请日期 1997.08.08
申请人 FUJITSU LIMITED 发明人 MATSUYAMA TAKAYOSHI;KOBAYASHI KEN-ICHI
分类号 G03F1/08;G06T1/00;G06T7/00;H01L21/66;(IPC1-7):G06K9/00 主分类号 G03F1/08
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