| 摘要 |
A projection exposure apparatus exposes a substrate by projecting images of patterns formed on a plurality of masks onto the substrate through a projection system sequentially. At least one part of a first mask-driving system is disposed on one side of the projection system, and moves a first mask in a predetermined plane. A second mask-driving system moves a second mask independently from the first mask, in a plane which is the same as or parallel to that for the first mask. At least one part of the second mask-driving system is disposed on the one side of the projection system. A control system is associated with the first and second mask-driving systems, and controls the first and second mask-driving systems respectively in order to project an image of a pattern formed on the first mask and an image of a pattern formed on the second mask onto the substrate sequentially.
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