| 摘要 |
Semiconductor structures and a method of forming semiconductor structures The avalanche breakdown characteristics, such as breakdown voltage and impact ionisation coefficient, of a semiconductor structure can be controlled by controlling the Brillouin-zone-averaged energy bandgap (<Ec>) of the material forming the structure. Consequently, the avalanche breakdown characteristics of a device may be tailored independently of the bandgap Eg. The Brillouin-zone-averaged energy bandgap (<Ec>) may be controlled by controlling the composition of the semiconductor used or by straining its lattice.
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