METHOD AND APPARATUS FOR THE COMBUSTION CHEMICAL VAPOR DEPOSITION OF FILMS AND COATINGS

摘要

A method for applying coatings to substrates using combustion chemical vapor deposition by mixing together a reagent and a carrier solution to form a reagent mixture, igniting the reagent mixture to create a flame, or flowing the reagent mixture through a plasma torch, in which the reagent is at least par tially vaporized into a vapor phase, and contacting the vapor phase of the reagent to asubstrate resulting in the deposition, at least in p art from the vapor phase, of a coating of the reagent which can be controlled so as to have a preferred ori entation on the substrate, and an apparatus to accomplish this method. The figure sho ws a schematic of a CCVD apparatus where the substrate (22) can be placed withi n the reducing region (32) of the Smithell separator (30) between the inner fl ame (18a) and the outer flame (18b) .