发明名称 Method of fabricating self-aligned multilevel mask ROM
摘要 A method of fabricating self-aligned multilevel mask read only memory (ROM). The method can improve the process window to reduce process difficulty by utilizing the self-aligned implantation. Moreover, by utilizing the connection between the word line and the gate and implantation of the ROM code with self-aligned implatiation to increase the difference between the threshold voltages of different gates, and therefore, multilevel cell transistors with for the mask ROM with multilevel threshold voltages are formed to times the capacity of the mask ROM.
申请公布号 US6326269(B1) 申请公布日期 2001.12.04
申请号 US20000731929 申请日期 2000.12.08
申请人 MACRONIX INTERNATIONAL CO., LTD. 发明人 JENG PEI-REN;LEE C. Y.
分类号 H01L21/8246;(IPC1-7):H01L21/823 主分类号 H01L21/8246
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