发明名称 SPUTTER ION PUMP
摘要 PROBLEM TO BE SOLVED: To provide a sputter ion pump that can make its structure simpler and lightweight, and with which its magnetic field near the central axis can be made zero both in the radial and the axial directions, and ultimate pressure of the pump can be made higher. SOLUTION: This sputter ion pump is formed so that the cylindrical portion of the vacuum chamber wall has undulated cross section and permanent magnets with the identical shape, and characteristics are provided in each concave outside the cylindrical portion of this undulated cross section with the same polarity. Provided in each concave inside the cylindrical portion is a cylindrical anode at an interval from the vacuum chamber wall, and the cylindrical portion of the vacuum chamber is constituted as the cathode. In the vacuum chamber, a cylindrical magnetic shielding member, surrounded by evacuation holes is disposed concentrically with a plurality of the permanent magnets and a plurality of the anodes, and these magnets and anodes are respectively disposed at equal intervals.
申请公布号 JP2001332209(A) 申请公布日期 2001.11.30
申请号 JP20010070910 申请日期 2001.03.13
申请人 ULVAC JAPAN LTD 发明人 CHIN KOKUKA
分类号 F04B37/02;H01J27/08;H01J41/18;H01J41/20;(IPC1-7):H01J41/18 主分类号 F04B37/02
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