POSITIVE TYPE PHOTORESIST COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an improved positive type photoresist composition which solves the problem of occurrence of development defects in the production of a semiconductor device. SOLUTION: The positive type photoresist composition contains (A) a resin containing repeating structural units each having a specified bridged alicyclic structure and repeating structural units each having a specified acetal structure and having a velocity of dissolution in an alkali developing solution increased by the action of an acid and (B) a compound which generates the acid when irradiated with active light or radiation.