| 摘要 |
PROBLEM TO BE SOLVED: To provide a space-saving apparatus for removing a photoresist in which ozonized water of a high concentration is rapidly and precisely produced, a photoresist unnecessitated in a photolithography step in the production of a semiconductor, a liquid crystal or the like can be removed with good production efficiency and an aerator and a vapor-liquid separation tower are unnecessary. SOLUTION: In the apparatus for removing a photoresist, the photoresist pattern layer of each photoresist laminate unnecessitated after the etching of the photoresist laminate with the photoresist pattern layer formed on a substrate is removed with ozonized water produced by separating raw water and gaseous ozone using a gaseous ozone permeation membrane being gas- permeable but liquid-impermeable and dissolving gaseous ozone in the raw water. |
